HS Code 3923109010: Plastic Boxes and Crates
HS code 3923109010 is an 10-digit code for Plastic Boxes and Crates, under the 6-digit subheading 392310. The first 6 digits are standardized worldwide; the digits beyond are set by each country.
See real import & export shipment data for 3923109010HS Code 3923109010 Description by Country
3923109010 is listed across 31 countries' HS schedules. The table below shows how each country defines it under its own standard, with the local description and a link to its real import and export trade data.
Austria HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Belgium HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Bulgaria HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Canada HS Code
HS Code 3923109010 Egg trays, of plastics
Croatia HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Cyprus HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Czech Republic HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Denmark HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Estonia HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Finland HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
France HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Germany HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Greece HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Hungary HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Ireland HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Italy HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Jamaica HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics: Other: Boxes made wholly or in part of expanded polystyrene foam
Latvia HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Lithuania HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Luxembourg HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Malta HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Netherlands HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Poland HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Portugal HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Romania HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Slovakia HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Slovenia HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Spain HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Sweden HS Code
HS Code 3923109010 for the conveyance or packaging of goods, of plastics (excl. special ones for semiconductor wafers, masks or reticles) : Photomask or wafer compacts: -|consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, -|having non porous, abrasion resistant or impact resistant surface properties, -|fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and -|with or without a gasket seal,of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
United Kingdom HS Code
HS Code 3923109010 Photomask or wafer compacts: - consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (esd) and outgassing properties, - having non porous, abrasion resistant or impact resistant surface properties, - fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and - with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
Uruguay HS Code
HS Code 3923109010 Artículos para el transporte o envasado de plástico; tapones tapas cápsulas y demás dispositivos de cierre de plástico: Cajas cajones jaulas y artículos similares: Los demás: De polietileno con forma de paralelepípedo rectangular de las siguientes medidas mínimas; longitud 100 cm ancho 90 cm y altura 56 cm
Frequently Asked Questions
What is HS code 3923109010?
HS code 3923109010 is an 10-digit code for Plastic Boxes and Crates, under the 6-digit subheading 392310 of the Harmonized System. The first 6 digits are standardized worldwide; the rest are national.
Is HS code 3923109010 the same in every country?
Which countries use HS code 3923109010?