HS Code 3920102300: Polyethylene Sheets and Film
HS code 3920102300 is an 10-digit code for Polyethylene Sheets and Film, under the 6-digit subheading 392010. The first 6 digits are standardized worldwide; the digits beyond are set by each country.
See real import & export shipment data for 3920102300HS Code 3920102300 Description by Country
3920102300 is listed across 46 countries' HS schedules. The table below shows how each country defines it under its own standard, with the local description and a link to its real import and export trade data.
Albania HS Code
HS Code 39201023000 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Armenia HS Code
HS Code 3920102300 Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials: Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Austria HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Azerbaijan HS Code
HS Code 3920102300 Plates, sheets, film, foil and strip, of non-cellular polymers of ethylene, not reinforced, laminated, supported or similarly combined with other materials, without backing, unworked or merely surface-worked or merely cut into squares or rectangles (excl. self-adhesive products, and floor, wall and ceiling coverings of heading 3918) : Of a thickness not exceeding 0,125 mm : of polyethylene, net weight : Less than 0,94 : Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Belarus HS Code
HS Code 3920102300 Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials: Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Belgium HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Bosnia and Herzegovina HS Code
HS Code 3920102300 Plates, sheets, film, foil and strip, of non-cellular polymers of ethylene, not reinforced, laminated, supported or similarly combined with other materials, without backing, unworked or merely surface-worked or merely cut into squares or rectangles (excl. self-adhesive products, and floor, wall and ceiling coverings of heading 3918) : Of a thickness not exceeding 0,125 mm : Of polyethylene having a specific gravity of : Less than 0,94 : Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Bulgaria HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Croatia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Cyprus HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Czech Republic HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Denmark HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Estonia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Finland HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
France HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Georgia HS Code
HS Code 39201023000 Plates, sheets, film, foil and strip, of non-cellular polymers of ethylene, not reinforced, laminated, supported or similarly combined with other materials, without backing, unworked or merely surface-worked or merely cut into squares or rectangles (excl. self-adhesive products, and floor, wall and ceiling coverings of heading 3918) : Of a thickness not exceeding 0,125 mm : Of polyethylene having a specific gravity of : Less than 0,94 : Polyethylene film, of a thickness of 20 micrometres or more but not exceeding40 micrometres, for the production of photoresist film used in the manufactureof semiconductors or printed circuits
Germany HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Greece HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Hungary HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Ireland HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Italy HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Kazakhstan HS Code
HS Code 3920102300 Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials: Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Kosovo HS Code
HS Code 3920102300 Plates, sheets, film, foil and strip, of non-cellular polymers of ethylene, not reinforced, laminated, supported or similarly combined with other materials, without backing, unworked or merely surface-worked or merely cut into squares or rectangles (excl. self-adhesive products, and floor, wall and ceiling coverings of heading 3918) : Of a thickness not exceeding 0,125 mm, Of polyethylene having a specific gravity of, Less than 0,92 : Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 20 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Kyrgyzstan HS Code
HS Code 3920102300 Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials: Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Latvia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Lithuania HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Luxembourg HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Malta HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Montenegro HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Netherlands HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
North Macedonia, Republic of HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Poland HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Portugal HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Romania HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Russian Federation HS Code
HS Code 3920102300 Other plates, sheets, film, foil and strip, of plastics, non-cellular and not reinforced, laminated, supported or similarly combined with other materials: Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Serbia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Slovakia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Slovenia HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Spain HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Sweden HS Code
HS Code 3920102300 Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Tajikistan HS Code
HS Code 3920102300 Of polymers of ethylene: Of a thickness not exceeding 0,125mm: Of polyethylene having a specific gravity of: Less than 0,94: Polyethylene film, of a thickness of 20micrometres or more but not exceeding 40micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Tunisia HS Code
HS Code 39201023001 Feuille en polyethylene d'une densite < a 0.94,non alveolaire,non renforcee ni stratifiee,ni munie d'un support,ni pareillement associee a d'autres mat.,d'une epaisseur de 20 micrometres ou + mais <=a 40 micro.destines a la fab.de film photoresistant pour les semi-conduct. ou des circuits imprimes
Turkey HS Code
HS Code 392010230000 Polyethylene film; for the manufacture of opaque film, specific gravity < 0.94, 20 micrometres <= thickness <= 40 micrometres
Ukraine HS Code
HS Code 3920102300 Of polymers of ethylene: Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photo-resist film used in the manufacture of semiconductors or printed circuits
United Kingdom HS Code
HS Code 3920102300 Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Uzbekistan HS Code
HS Code 3920102300 Plates, sheets, film, foil and strip, of non-cellular polymers of ethylene, not reinforced, laminated, supported or similarly combined with other materials, without backing, unworked or merely surface-worked or merely cut into squares or rectangles (excl. self-adhesive products, and floor, wall and ceiling coverings of heading 3918) : Less than 0,94 : Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Frequently Asked Questions
What is HS code 3920102300?
HS code 3920102300 is an 10-digit code for Polyethylene Sheets and Film, under the 6-digit subheading 392010 of the Harmonized System. The first 6 digits are standardized worldwide; the rest are national.
Is HS code 3920102300 the same in every country?
Which countries use HS code 3920102300?